Khoom Txheej Txheem

Beilun Hlau Cov Khoom Siv Hluav Taws Xob Hluav Taws Xob Hluav Taws Xob (99.99% + Purity Electrities Ua kom tiav cov txheej txheem lithium-ion, semiconductor plating, thiab alloys tshwj xeeb. Qhov zoo tagnrho rau kev lag luam uas yuav tsum muaj tsawg heev me me me me me me me me me me me me me me me me me me ntawm cov tsis muaj zog hauv electrochemical ruaj khov.

Cov ntsiab lus tseem ceeb ntawm ib nrais muag

Chaw ua uas tsis tau haus	Kev qhia tshwj xeeb
Kev coj dawb huv	99.99% -99.997% (FEM)
Puab	Cathode cov ntawv, ya ri, hmoov
Qhov tuab	{{0 {0}}. 5-5mm (cov ntawv txheeb), 50-200μm (hmoov)
Nto roughness	Ra tsawg dua lossis sib npaug rau 0. 8μm (tsom iav tiav)
Oxygen Cov Ntsiab Lus	Tsawg dua los yog sib npaug rau 80 ppm (cov kev xaiv tau ntim khoom: tsawg dua los yog sib npaug rau 30 ppm)
Ntawv muaj	ISO 9001, U ECSS-Q-St -70-06 c

Tshuaj lom neeg muaj pes tsawg leeg rooj

Lub ntsiab	Raug (ppm)	Max tso cai (PPM)	Txoj kev kuaj pom
Zaum fe	999,900	–	ICP-OES
C	Tsawg dua los yog sib npaug rau 15	30	Kev Tshawb Fawb Kev Tshawb Fawb
S	Tsawg dua los yog sib npaug rau 8	15	Leco s -144 dr
P	Tsawg dua los yog sib npaug rau 10	20	UV-VIS Spectrophhotometry
CU	Tsawg dua los yog sib npaug rau 5	10	Lub hiav txwv
Ni	Tsawg dua los yog sib npaug rau 3	8	ICP-MS
O	Tsawg dua los yog sib npaug rau 80	120	Inert gas fusion

Cov Lus Cim: Hydrogen tsawg dua lossis sib npaug rau 2 ppm; Ib txoj kab kawm (MN, CR, TI) tsawg dua los yog sib luag rau 5 ppm txhua.

Kev sib piv sib piv

Ntiag tug	Beilun Electrolytic Hlau	Kev Lag Luam Cov Qauv Kev Lag Luam Electrolytic
Kev ua tau zoo tam sim no	98.5% (cuso₄ da dej)	92–96%
Cathodic Purity	99.997%	99.95–99.99%
Porosity Deg	0 pores / cm²	Tsawg dua lossis sib npaug rau 3 pores / cm
Dendrite tsim	Tsis muaj (tswj kev loj hlob)	Kev pheej hmoo tsawg
Rov ua dua tshiab	99%	95–97%

Cov Khoom Siv technical

Tus yam ntxwv	Tus nqi	Kuaj Tus Qauv
Hluav Taws Xob Kev Tshaj Tawm	9.93 × 10⁶ S/m	ASTM B193
Thermal conductivity	79.8 W/m·K	Iso 22007-2
Ceev	7.874 g / cm³	ASTM B311
Vickers hardness	35-50 hv	Iso 6507-1
Crystallographic Tus Qauv	BCC (-Oir)	XRD Kev Ntsuam Xyuas

Cov Ntawv Qhia Tseem Ceeb

Kev daws teeb meem

- Roj teeb manufacturing: anode Cov neeg sau khoom tam sim no, lifepo₄ precursors

- Electroplating: High-pov Semiconductor substrates, EMI / RFI Shielding

- Tshuaj lom neeg catalysts: Fischer-Tropsch catalyst txhawb nqa, hydrogenation reactors reactors

- Adillitive Manufacturing: Spherical hmoov rau phau ntawv Jetting (D50: 15-45μm)

Cim Cim

Pes tsawg organic seem: yaug nrog dej deionized + ethanol

Nchuav Morphologology: COLREPHOLOGY: COLRECHOLOGY, ETOINED, lossis NANO-WHISTCHER Txheej Txheem

Tsawg hydrogen embrittlement: ci-out kho ntawm 300 degree hauv qab nqus

Cov Txheej Txheem Ntau Lawm & Kev Tswj Xyuas Zoo

Lub sam thiaj	Tej txuj ci tshiab	Cov Cuab Yeej Tseem Ceeb tswj
Elololsissis	HCL-raws li cov hlwb hluav taws xob	Cov ceev tam sim no: 200-450 a / m²
Ntxuav	Txee-tam sim no ultrasonic rinsing	Kev coj ua<5 μS/cm
Kom qhuav	Lub Tshuab Nqus Tshuab	Noo noo tsawg dua lossis sib npaug nrog 50 ppm
Tshawb xyuas	Laser Diffraction (ISO 13320)	D90 <75μm (powder)
Ntim	Nitrogen-rwb laminated ntawv nyiaj	Cov pa oxygen<0.01% vol/day